Li, Yiming (National Chiao Tung University), Chen, Yu-Yu (National Chiao Tung University, NTCU)

Statistical Device Simulation of Intrinsic Parameter Fluctuation in 16-Nm-Gate N and P-Type Bulk FinFETs

Scheduled for presentation during the Oral Session "Simulation and Modeling of Nanostructures and Nanodevices" (WeA6), Wednesday, August 7, 2013, 13:30−13:45, Diamond III

13th IEEE International Conference on Nanotechnology, August 5-8, 2013, Shangri-La Hotel, Beijing, China

This information is tentative and subject to change. Compiled on November 18, 2019

Abstract

In this paper, we estimate the influence of random dopants (RDs), interface traps (ITs), and random work functions (WKs) using the experimentally calibrated 3D device simulation on DC characteristic of high-k/ metal gate n- and p-type bulk fin-typed field-effect-transistors. We further study these intrinsic parameter fluctuations’ impact on drain induced barrier lowering (DIBL). The main findings of this work show the RDF and WKF on n-type device are larger than that of p-type one. The DIBL is dominated by the number of random dopants.